Development of a microwave ion source for ion implantations.
نویسندگان
چکیده
A microwave ion source is expected to have a long lifetime, as it has fewer consumables. Thus, we are in the process of developing a microwave ion source for ion implantation applications. In this paper, we report on a newly developed plasma chamber and the extracted P(+) beam currents. The volume of the plasma chamber is optimized by varying the length of a boron nitride block installed within the chamber. The extracted P(+) beam current is more than 30 mA, at a 25 kV acceleration voltage, using PH3 gas.
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عنوان ژورنال:
- The Review of scientific instruments
دوره 87 2 شماره
صفحات -
تاریخ انتشار 2016